Principles of Lithography, Second Edition (SPIE Press Monograph Vol. PM146)

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Description

Lithography is a field in which advances proceed at a swift pace. This book used to be written to address several needs, and the revisions for the second one edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place all over the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who find themselves unfamiliar with the subject. Topics in an instant related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also comprises a large number of references for students who need to investigate particular topics in more detail, they usually give you the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Contents

– Preface

– Overview of lithography

– Optical pattern formation

– Photoresists

– Modeling and thin film effects

– Wafer steppers

– Color Plates overlay

– Masks and reticules

– Overcoming the diffraction limit

– Metrology

– The limits of optical lithography

– Lithography costs

– Alternative lithography techniques

– Appendix A: Coherence

– Index

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